Papers accepted for ISMAR 2023 and SCF 2023
Two papers accepted: one for ISMAR 2023 on AR guidance for Line Tracing, and one for SCF 2023.
Paper accepted for CHI'2023
Our paper on measurements patterns for makers and manufacturing was accepted for the CHI'2023 conference. Co-authors are Raf Ramakers, Danny Leen, Jeeeun Kim, Steven Houben and Tom Veuskens